Author

Derren Dunn is currently Computational Enablement Team Lead at IBM Research where he leads efforts to migrate engineering design automation (EDA) flows to hybrid cloud burst flows as well as developing new cloud native flows. His current work also focuses on methods for securing EDA compute flows, process design kits, and design intellectual property in public cloud environments. Prior to serving as Advanced Patterning Technology Lead, Derren held several team lead and management positions in computational patterning within IBM’s Semiconductor Research and Development Center in Hopewell Junction New York. He has deep experience in developing optical, resist, and process bias models for use in optical proximity correction and advanced lithography simulation. In addition, Derren has led efforts in semiconductor patterning within the IBM International Semiconductor Development Alliance (ISDA) as 7nm Patterning Technology Lead.